NICOLAS BAUDUIN 32 rue le corbusier 92100 Boulogne Billancourt Phone +33 1 45 18 97 58 GSM +33 6 87 20 56 04 E mail [email protected] Web: http://n.bauduin.free.fr Birthday: 1974 July 04th French, single

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PROCESS DEVELOPMENT ENGINEER PhD APPLIED CHEMISTRY & INDUSTRIAL PROCESS ENGINEERING

Pierre & Marie CURIE University, Paris-France

FORMATION PhD: Deposition of thin tin oxide layer with PECVD plasma; Applied chemistry & industrial process engineering; Pierre & Marie CURIE University, Paris Plasma Process Engineering and Surface treatment Laboratory (LGPPTS). Master of Applied chemistry and industrial process engineering Pierre & Marie CURIE University, Paris - France. Superior chemical technician Ecole Nationale de Chimie, Physique et Biologie, Paris - France. PROFESSIONAL EXPERIENCE Process development Engineer Reactor Hardware responsible UNAXIS France SAS, Palaiseau-France. Hardware responsible for PECVD reactors large area (Gen5) Process development engineer (single layer development for TFT LCD manufacturing). Follow-up and improvement of PECVD reactors. Process installation on site (Taiwan, China), Customer support . Development Engineer FCI Microconnections, Mantes la Jolie-France. European project manager for development of connector on thin and flexible printed circuits (Flex on Chip and TAB pitch 80 to 54 µm). PhD; Plasma Process Engineering and Surface treatment Laboratory (LGPPTS, Paris France) . Online characterization and numerical model of PECVD plasma; Development, physical-chemical characterization and optimization of thin tin oxide layer (pure or doped). Master Student. Plasma Process Engineering and Surface treatment Laboratory (LGPPTS, Paris France). Polymer surface treatment with plasma processes; improvement of metal-polymer adhesion; Modification and control of surface properties of polymers; plasma polymerisation. Master Student Surface reactivity laboratory; Pierre & Marie Curie University; Paris -France. Synthesis and study of tungsten based catalyst. Technician Institut National de l'Environnement Industriel et des Risques, Verneuil-en-Halatte (Oise). Characterization and certification of various gas cocktail with gas chromatography. LANGUAGE Mother language Fluent (professional daily language). PERSONNAL

Driving license Sport: Hobbies:

Archery; Management team member since 15 years, Local championship; Organization of local to National championship Photography, excursions, cuisine.

PUBLICATIONS F.Arefi-Khonsari, N. Bauduin, F.Donsanti, J.Amouroux "Deposition of transparent conductive tin oxide thin films doped with fluorine by PACVD Thin solid films (2002) W.Morscheidt, K.Hassouni, N. Bauduin, F.Arefi-Khonsari, J.Amouroux "On the use of a global kinetics models for the investigation of energy deposition and chemistry in RF argon-oxygen plasmas working in the torr regime". Plasma Chemistry and Plasma Processing (2002) W.Morscheidt, K.Hassouni, N. Bauduin, F.Arefi-Khonsari, J.Amouroux "Modeling and experimental study of an O2/Ar/ TMT discharge used for the deposition of transparent conductive thin Tin Oxide films " E-MRS 2002 Meeting, Strasbourg, June 18-21, 2002 F.Arefi-Khonsari, N. Bauduin, F.Donsanti, J.Amouroux, "Deposition of Transparent Conductive Tin Oxide thin films doped with fluorine by PACVD" E-MRS 2002 Meeting, Strasbourg, June 18-21, 2002 N. Bauduin, F. Arefi-Khonsari, J. Amouroux "Spectroscopic study of the energetic character of O2/Ar/Tetramethyltin discharge used for the deposition of transparent conductive thin tin oxide films" 15th International Symposium on Plasma Chemistry (ISPC), July 9-13, 200 N. Bauduin, F. Arefi-Khonsari, J. Amouroux " Deposition of transparent conductive tin oxide films doped with fluorine by PACVD" 15th International Symposium on Plasma Chemistry (ISPC), July 9-13, 2001 W. Morscheidt, K. Hassouni, N. Bauduin, F. Arefi-Khonsari, J. Amouroux "Kinetics nodels for the investigations of the effect of power deposition uniformity on R.F. argon-oxygen plasmas working in the torr regime" 15th International Symposium on Plasma Chemistry (ISPC), July 9-13, 2001 M. Nikravech, N. Bauduin, D. Morvan, J. Amouroux "Low pressure R.F. plasma shock wave reactor to synthetise and deposit of Sr doped LaMnO3 thin layers for fuel cell applications" 15th International Symposium on Plasma Chemistry (ISPC), July 9-13, 2001 F. Arefi-Khonsari, N. Bauduin, J. Amouroux "Deposition of transparent tin oxide films: study of the energetic character of the discharge by a spectroscopy study" 14th Colloqium on Plasma Processes CIP2001 F. Arefi-Khonsari, N. Bauduin, F. Hellegouarc h, R. Planade, J. Amouroux " Deposition of transparent conductive tin oxide thin films by PECVD for sensor aplications" 14th International Symposium on Plasma Chemistry (ISPC), Prague, Czech Republic (1999). W. Morscheidt, K. Hassouni , N. Bauduin, J. Amouroux, F. Arefi-Khonsari "Modelling of chemical kinetics and energy transfer in O2/Ar discharges obtained under high frequency electric field " 14th International Symposium on Plasma Chemistry (ISPC), Prague, Czech Republic (1999). F. Arefi-Khonsari, N. Bauduin, F. Hellegouarc h, R. Planade, J. Amouroux "Deposition of transparent conductive tin oxide thin films by PECVD for sensor applications" 12th Colloqium on Plasma Processes CIP 99 Antibes (1999) F. Hellegouarc h, N. Bauduin, F. Arefi-Khonsari, J Amouroux Journées couches minces, Société des électriciens et électroniciens, Ecole Polytechnique (1998)